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Abstract Ferroelectricity in hafnia films has triggered significant research interest over the past decade due to its immense promise for next‐generation memory devices. However, the origin of ferroic behavior at the nanoscale and the means to control it remain an open question, with the consensus being that it deviates from conventional ferroelectrics. In this work, a novel approach is presented to tune ferroelectric properties of hafnia through environmental control using piezoresponse force microscopy (PFM). A reversible transition from non‐ferroelectric to ferroelectric behavior by modulating the surrounding atmosphere is demonstrated. Notably, the domain relaxation dynamics exhibit striking sensitivity to environmental factors, including ambient conditions, specific gas compositions (N₂, CO₂, O₂), and humidity levels. The critical role of surface water removal, gas molecule adsorption, and their interactions with near‐surface oxygen vacancies is identified and the injected charge in determining ferroelectricity in uncapped hafnia films. These insights reveal a significant strategy for stabilizing ferroic responses by carefully regulating the chemical environment, offering new possibilities for precise control in hafnia‐based films. 

Abstract Contamination of high‐touch surfaces with infected droplets of bodily secretions is a known route of virus transmission. Copper surfaces have been reported to inactivate human coronaviruses after several minutes, via the release of Cu cations. Utilization of copper alloys for high‐touch surfaces can be a pivotal preemptive strategy for preventing the next pandemic. Understanding the true efficacy by which copper, and copper alloys, inactivate the virus under realistic conditions is essential for tuning intrinsic alloy features such as composition, grain orientation, and surface attributes, to optimize for antiviral function. However, virus inactivation measurements depend on the presence of an assay media (AM) solution as a carrier for the virus, and its effects on the surface properties of pure copper that regulate oxidative copper release are previously unknown. Herein, these properties and the influence of AM on the efficacy of virus inactivation occurring on the surface of pure copper are investigated. The process is uncovered by which a five‐fold decrease in virus half‐life is observed in simulated real‐life conditions, relative to exposure to traditional AM. The investigation highlights the notion that virus inactivation on copper surfaces may be significantly more effective than previously thought.